Kofloc ST-500 SERIES Mass Flow Controllers

Description

The Kofloc Model ST-500 Series addresses one of the most significant challenges in gas control: supply pressure instability. Traditional mass flow controllers can suffer from flow drift when inlet pressures fluctuate. The ST-500’s PI (Pressure Insensitive) technology uses high-speed internal sensors and a proprietary algorithm to detect and compensate for pressure changes in real-time, ensuring that your process receives the exact flow commanded, without delay or deviation.

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A Mass Flow Controller (MFC) is a device used to precisely regulate and control gas mass flow in various industrial and laboratory processes. Unlike conventional flow meters, which only measure velocity or volume, an MFC can both measure and regulate gas flow based on mass, resulting in much more accurate results—especially in applications that require tight and consistent control, such as the semiconductor, pharmaceutical, chemical, and gas analysis industries.

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Brand

Kofloc

The natural environment is preserved through the balance of solids, liquids and gases that exist on the earth. However, human civilization has caused pollution that has greatly damaged our environment. The task of the present generation is to restore our environment to its natural healthy state. And this is also the greatest challenge for 21st century science and technology.

KOFLOC's corporate motto is "A Scientific Approach for Fluids." In other words, we create products that scientifically measure and control the balance of liquids and gases. We trust that through our work we are making a contribution to the regeneration of the environment and to the establishment of a prosperous society.

Specifications

Sensor type : Thermal sensor
Valve type : Proportional solenoid valve (normally closed)
Applicable gas : N₂ (Air, H₂, He, Ar, O₂, CO₂, CH₄/C.F. input)
Full-scale flow rate (N2 equivalent) : 10SCM 10SLM
Control range 2～100%F.S.
Respones : Within 1sec.
Accuracy ±1%S.P.(＞10-100%F.S.)
Repeatability ±0.2%F.S.

Features

Metal Seal Construction: Provides high-purity gas paths and superior leak integrity for corrosive gases.
High-Speed Control: Reaches set-point stability in $leq 1$ second across the entire flow range.
MG/MR Capability: Field-configurable for multiple gases and variable full-scale ranges (30%–100% FS)

Applications

Semiconductor Fabrication: Stable gas delivery for Etch, CVD, and ALD processes.
Gas Panel Manufacturing: Ideal for high-density, high-purity gas distribution systems.
Analytical Research: Precise flow control for high-sensitivity mass spectrometry.
Chemical Vapor Deposition: Consistent precursor delivery in fluctuating pressure environments.
Fiber Optic Production: Managing high-purity dopant gases with zero contamination.