Kofloc HFC-303 SERIES Mass Flow Controllers

Description

The Kofloc Model HFC-303 Series is engineered for applications where speed and accuracy are non-negotiable. While standard controllers often exhibit “hunting” or long stabilization times, the HFC-303 utilizes a high-sensitivity bridge-type thermal sensor and sophisticated digital processing to ensure a smooth, instantaneous flow ramp.

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A Mass Flow Controller (MFC) is a device used to precisely regulate and control gas mass flow in various industrial and laboratory processes. Unlike conventional flow meters, which only measure velocity or volume, an MFC can both measure and regulate gas flow based on mass, resulting in much more accurate results—especially in applications that require tight and consistent control, such as the semiconductor, pharmaceutical, chemical, and gas analysis industries.

Brand

Kofloc

The natural environment is preserved through the balance of solids, liquids and gases that exist on the earth. However, human civilization has caused pollution that has greatly damaged our environment. The task of the present generation is to restore our environment to its natural healthy state. And this is also the greatest challenge for 21st century science and technology.

KOFLOC's corporate motto is "A Scientific Approach for Fluids." In other words, we create products that scientifically measure and control the balance of liquids and gases. We trust that through our work we are making a contribution to the regeneration of the environment and to the establishment of a prosperous society.

Specifications

Sensor type Thermal sensor
Valve TYpe Proportional solenoid valve (normally closed)
Applicable gas N₂, Air, H₂, He, Ar, O₂, CO₂
Full-scale flow rate 100SCCM to 300SLM
Control range 2 to 100%F.S.
Accuracy ±1%F.S. (25℃)
TEmperature coefficient ±0,1%F.S. /℃ (15 to 35℃)
Proof preasure 3.4MPa(G)
Allowable ambient temperature 5 to 45℃
Allowable storage temperature -10 to 60℃

Features

High-Precision Solenoid Valve: Ensures smooth, flicker-free flow regulation across the entire range.
Digital PID Control: Advanced algorithms prevent overshoot and maintain tight set-point accuracy.
Thermal Mass Sensing: Flow measurement is independent of temperature and pressure fluctuations.

Applications

Semiconductor Manufacturing: Precise control of process and purge gases.
Analytical Instrumentation: Managing carrier gas flow for high-speed gas chromatography.
Thin-Film Deposition: Stable regulation of reactive gases in sputtering and CVD systems